• DocumentCode
    1626281
  • Title

    3D silicon micromachined RF resonators

  • Author

    Strohm, K.M. ; Schmuckle, F.J. ; Yaglioglu, O. ; Luy, J.-F. ; Heinrich, W.

  • Author_Institution
    DairnlerChrysler Res. Center, Ulm, Germany
  • Volume
    3
  • fYear
    2003
  • Firstpage
    1801
  • Abstract
    Passive components with high quality factor are required for many applications, e.g., filters. In the field of micromachining, this is commonly achieved by using multiple-wafer structures. An alternative technique is presented here together with design and measurement data, which is based on MEMS technology and yields single-wafer resonators thus reducing costs. Cavity resonators with the Si being partly removed show quality factors Q beyond 360.
  • Keywords
    Q-factor; cavity resonators; micromachining; micromechanical resonators; MEMS technology; Si; cavity resonators; costs; micromachined RF resonators; multiple-wafer structures; quality factor; single-wafer resonators; Anisotropic magnetoresistance; Cavity resonators; Coplanar waveguides; Dielectric losses; Fabrication; Gold; Plasma applications; Resists; Silicon; Sputter etching;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microwave Symposium Digest, 2003 IEEE MTT-S International
  • Conference_Location
    Philadelphia, PA, USA
  • ISSN
    0149-645X
  • Print_ISBN
    0-7803-7695-1
  • Type

    conf

  • DOI
    10.1109/MWSYM.2003.1210490
  • Filename
    1210490