DocumentCode
1626281
Title
3D silicon micromachined RF resonators
Author
Strohm, K.M. ; Schmuckle, F.J. ; Yaglioglu, O. ; Luy, J.-F. ; Heinrich, W.
Author_Institution
DairnlerChrysler Res. Center, Ulm, Germany
Volume
3
fYear
2003
Firstpage
1801
Abstract
Passive components with high quality factor are required for many applications, e.g., filters. In the field of micromachining, this is commonly achieved by using multiple-wafer structures. An alternative technique is presented here together with design and measurement data, which is based on MEMS technology and yields single-wafer resonators thus reducing costs. Cavity resonators with the Si being partly removed show quality factors Q beyond 360.
Keywords
Q-factor; cavity resonators; micromachining; micromechanical resonators; MEMS technology; Si; cavity resonators; costs; micromachined RF resonators; multiple-wafer structures; quality factor; single-wafer resonators; Anisotropic magnetoresistance; Cavity resonators; Coplanar waveguides; Dielectric losses; Fabrication; Gold; Plasma applications; Resists; Silicon; Sputter etching;
fLanguage
English
Publisher
ieee
Conference_Titel
Microwave Symposium Digest, 2003 IEEE MTT-S International
Conference_Location
Philadelphia, PA, USA
ISSN
0149-645X
Print_ISBN
0-7803-7695-1
Type
conf
DOI
10.1109/MWSYM.2003.1210490
Filename
1210490
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