• DocumentCode
    1626583
  • Title

    Fabrication and characteristics of high speed implant-confined, index-guided, lateral-current, 850 nm vertical cavity surface emitting lasers

  • Author

    Dang, G.T. ; Mehandru, R. ; Luo, B. ; Ren, F. ; Hobson, W.S. ; Lopata, J. ; Tayahi, M. ; Chu, S.N.G. ; Pearton, S.J. ; Chang, W. ; Shen, H.

  • Author_Institution
    Dept. of Chem. Eng., Florida Univ., Gainesville, FL, USA
  • fYear
    2002
  • fDate
    6/24/1905 12:00:00 AM
  • Abstract
    Process technology of high-speed implant-apertured, index-guide, lateral-current-injection, dielectric-mirror GaAs quantum well vertical cavity surface emitting lasers has been developed. Oxygen and helium implantation for aperture definition and extrinsic capacitance reduction, dielectric mirror formation, p- and n-ohmic contact formation, were investigated. GaAs/AlGaAs based 850 nm VCSELs with small signal modulation bandwidths up to 11.5 Gb/s and an eye diagram generated at 12 Gb/s by a pseudorandom bit sequence (PRBS) of 231-1 were achieved. The with bit-error rates were below 10-13. The threshold current is as low as 0.8 mA for 7 mm diameter current apertures and typical slope efficiencies of 0.45-0.5 mA/mW are obtained for output mirror reflectivity of 99.5%.
  • Keywords
    III-V semiconductors; aluminium compounds; gallium arsenide; ion implantation; laser mirrors; ohmic contacts; quantum well lasers; surface emitting lasers; 0.8 mA; 11.5 Gbit/s; 12 Gbit/s; 7 mm; 850 nm; GaAs-AlGaAs; GaAs/AlGaAs quantum well vertical cavity surface emitting laser; aperture definition; bit error rate; dielectric mirror; extrinsic capacitance; eye diagram; fabrication process technology; helium implantation; high-speed implant confinement; index guiding; lateral current injection; ohmic contact formation; oxygen implantation; pseudorandom bit sequence; reflectivity; slope efficiency; small-signal modulation bandwidth; threshold current; Apertures; Dielectrics; Gallium arsenide; Helium; Mirrors; Optical device fabrication; Oxygen; Quantum well lasers; Surface emitting lasers; Vertical cavity surface emitting lasers;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Devices, Circuits and Systems, 2002. Proceedings of the Fourth IEEE International Caracas Conference on
  • Print_ISBN
    0-7803-7380-4
  • Type

    conf

  • DOI
    10.1109/ICCDCS.2002.1004048
  • Filename
    1004048