DocumentCode
1629875
Title
Performance improvements in polysilicon source-gated transistors
Author
Sporea, R.A. ; Trainor, M.J. ; Young, N.D. ; Shannon, J.M. ; Silva, S.R.P.
Author_Institution
Adv. Technol. Inst., Univ. of Surrey, Guildford, UK
fYear
2010
Firstpage
245
Lastpage
246
Abstract
The source-gated transistor (SGT) is a new type of transistor in which the current is controlled by a potential barrier at the source and by a gate which modulates the effective height of the source barrier. It is an ideal device architecture to be used with the low mobility materials typically applied to large area electronics, as it provides low saturation voltages and high output impedances. Furthermore, the high internal fields and low concentration of excess carriers lead to higher speed and better stability compared with FETs, particularly in disordered, low mobility semiconductors. As such, the SGT is especially well suited to thin-film analog circuits.
Keywords
elemental semiconductors; field effect transistors; silicon; thin film circuits; FET; SGT; device architecture; high output impedances; large area electronics; low mobility materials; low mobility semiconductors; low saturation voltages; performance improvements; polysilicon source-gated transistors; potential barrier; source barrier; thin-film analog circuits; Capacitance; Doping; FETs; Frequency response; Logic gates; Metals;
fLanguage
English
Publisher
ieee
Conference_Titel
Device Research Conference (DRC), 2010
Conference_Location
South Bend, IN
ISSN
1548-3770
Print_ISBN
978-1-4244-6562-0
Electronic_ISBN
1548-3770
Type
conf
DOI
10.1109/DRC.2010.5551977
Filename
5551977
Link To Document