DocumentCode
163125
Title
A test structure of bypass diodes for on-chip high-voltage silicon photovoltaic cell array
Author
Mori, I. ; Kubota, Minoru ; Mita, Y.
Author_Institution
Dept. of Electr. Eng., Univ. of Tokyo, Tokyo, Japan
fYear
2014
fDate
24-27 March 2014
Firstpage
157
Lastpage
160
Abstract
A bypass diode is an effective solution to the issue of output power degradation of a partially-shaded photovoltaic (PV) cell array. In this paper, we present a test structure of bypass diodes for the on-chip high voltage silicon PV cell array which we have previously proposed[3]. This structure was designed to determine the appropriate size of bypass diodes and whether their fabrication process could be performed successfully. We found from the measurement that a diode the diffusion layer of which is 5 μm × 5 μm works and that the diode size does not have an effect on the characteristics of PV cells. We also found that the number of shaded cells can be known from the I-V curve, which is useful when searching for the optimal position and orientation of a PV cell array.
Keywords
elemental semiconductors; semiconductor device testing; semiconductor diodes; silicon; solar cell arrays; I-V curve; PV cell array; Si; bypass diodes; diffusion layer; fabrication process; on-chip high-voltage silicon photovoltaic cell array; output power degradation; partially-shaded photovoltaic cell array; test structure; Arrays; Light emitting diodes; Photovoltaic cells; Semiconductor device measurement; Semiconductor diodes; Silicon; System-on-chip;
fLanguage
English
Publisher
ieee
Conference_Titel
Microelectronic Test Structures (ICMTS), 2014 International Conference on
Conference_Location
Udine
ISSN
1071-9032
Print_ISBN
978-1-4799-2193-5
Type
conf
DOI
10.1109/ICMTS.2014.6841485
Filename
6841485
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