• DocumentCode
    1635736
  • Title

    Current transport, gate dielectrics and band gap engineering in graphene devices

  • Author

    Zhu, Wenjuan ; Perebeinos, Vasili ; Neumayer, Deborah ; Freitag, Marcus ; Jenkins, Keith ; Zhu, Yu ; Avouris, Phaedon

  • Author_Institution
    IBM Thomas J. Watson Res. Center, Yorktown Heights, NY, USA
  • fYear
    2010
  • Firstpage
    1214
  • Lastpage
    1217
  • Abstract
    In this work, we studied current transport in mono-, bi-and tri-layer graphene. We find that both the temperature and carrier density dependencies in monolayer and bi-/tri-layers are diametrically opposite. These difference can be understood by the different density-of-states and the additional screening of the electrical field of the substrate surface polar phonons in bi-layer/tri-layer graphenes. We also find that silicon nitride can provide uniform coverage of graphene in field-effect transistors while preserving the channel mobility. Using this insulator, we studied field-induced band-gap or band-overlap in graphene with various numbers of layers.
  • Keywords
    carrier density; dielectric materials; field effect transistors; graphene; phonons; surface phonons; band gap engineering; bandoverlap; carrier density dependencies; channel mobility; electrical field; field-effect transistors; field-induced band-gap; gate dielectrics; graphene devices; substrate surface polar phonons; Charge carrier density; Dielectrics; Logic gates; Phonons; Photonic band gap; Scattering; Silicon;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid-State and Integrated Circuit Technology (ICSICT), 2010 10th IEEE International Conference on
  • Conference_Location
    Shanghai
  • Print_ISBN
    978-1-4244-5797-7
  • Type

    conf

  • DOI
    10.1109/ICSICT.2010.5667607
  • Filename
    5667607