DocumentCode
1639217
Title
Extension of common-emitter breakdown voltage for high speed Si/Si 1-xGex HBT´s
Author
Shah, M. Reaz ; Maziar, C.M.
Author_Institution
Dept. of Electr. & Comput. Eng., Texas Univ., Austin, TX, USA
fYear
1992
Firstpage
42
Lastpage
45
Abstract
Various collector structures were simulated to identify design options which lead to an increase in the breakdown voltage of high speed SiGe-base heterojunction bipolar transistors (HBTs). The authors propose an approach for increasing the breakdown voltage by appropriately tailoring the doping profile in the collector. A two-part collector doping profile was found to reduce the avalanche multiplication ratio by more than an order of magnitude. Simulation results indicate that this improvement can be achieved without severe degradation of the base pushout effect
Keywords
Ge-Si alloys; doping profiles; electric breakdown of solids; elemental semiconductors; heterojunction bipolar transistors; impact ionisation; semiconductor materials; silicon; HBTs; Si-SiGe; avalanche multiplication ratio; base pushout effect; collector structures; common-emitter breakdown voltage; heterojunction bipolar transistors; high speed; two-part collector doping profile; Avalanche breakdown; Breakdown voltage; Degradation; Doping profiles; Germanium silicon alloys; Heterojunction bipolar transistors; Impact ionization; Numerical simulation; Silicon germanium; Space charge;
fLanguage
English
Publisher
ieee
Conference_Titel
Bipolar/BiCMOS Circuits and Technology Meeting, 1992., Proceedings of the 1992
Conference_Location
Minneapolis, MN
Print_ISBN
0-7803-0727-5
Type
conf
DOI
10.1109/BIPOL.1992.274086
Filename
274086
Link To Document