Modeling and Implementation of Virtual Optical Lithography System Based on Volume Rendering

Author

Qicheng, Zhang ; Guangyi, Sun ; Xin, Zhao ; Junwei, Wang ; Chun, Jin ; Guizhang, Lu

Author_Institution

Inst. of Robotics & Autom. Inf. Syst., Tianjin

fYear

2007

Firstpage

783

Lastpage

786

Abstract

Virtual lithography system based on volume rendering is put forward. This system supports the input of masking pattern in BMP format and includes integrated diffraction and standing wave model. In comparison with other lithography simulators, this system supports the full 3D visualization of simulated result and interactive operations such as rotation and slice, which enables the user to fully visualize the internal structure of photoresist.

Keywords

data visualisation; electronic engineering computing; masks; micromechanical devices; photoresists; rendering (computer graphics); solid modelling; 3D visualization; BMP format; diffraction model; interactive operation; lithography simulation; masking pattern; photoresist internal structure visualization; standing wave model; virtual optical lithography system; volume rendering; Analytical models; Diffraction; Information systems; Lithography; Micromechanical devices; Resists; Robotics and automation; Sun; Tin; Visualization; Virtual lithography; diffraction; standing wave; volume rendering;

fLanguage

English

Publisher

ieee

Conference_Titel

Control Conference, 2007. CCC 2007. Chinese

Conference_Location

Hunan

Print_ISBN

978-7-81124-055-9

Electronic_ISBN

978-7-900719-22-5

Type

conf

DOI

10.1109/CHICC.2006.4346985

Filename

4346985