DocumentCode
1643276
Title
Coulomb oscillations in 100 nm and 50 nm CMOS devices
Author
Specht, M. ; Sanquer, M. ; Caillat, C. ; Guegan, G. ; Deleonibus, S.
Author_Institution
CEA, Centre d´Etudes Nucleaires de Grenoble, France
fYear
1999
Firstpage
383
Lastpage
385
Abstract
We investigate Coulomb oscillations at very low temperature in CMOS devices with nominal gate lengths of 100 nm and 50 nm and various widths. When the source drain conductance becomes smaller than the quantum e/sup 2//h, transport is dominated by resonant tunnelling through a single quantum dot formed by an impurity potential. Downscaling the channel length reduces the typical size of the impurity quantum dot pushing up the charging energy to at least several tens of Kelvin.
Keywords
Coulomb blockade; MOSFET; resonant tunnelling; semiconductor quantum dots; 100 nm; 50 nm; CMOS device; Coulomb oscillation; impurity quantum dot; resonant tunnelling; Electrons; Geometry; Implants; Impurities; MOSFETs; Quantum dots; Resonant tunneling devices; Silicon; Temperature; Wires;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting, 1999. IEDM '99. Technical Digest. International
Conference_Location
Washington, DC, USA
Print_ISBN
0-7803-5410-9
Type
conf
DOI
10.1109/IEDM.1999.824175
Filename
824175
Link To Document