• DocumentCode
    1649234
  • Title

    The effect of N-doping of MQWS on the properties of deep ridge transistor lasers

  • Author

    Lijun Qiao ; Song Liang ; Liangshun Han ; Junjie Xu ; Hongliang Zhu

  • Author_Institution
    Key Lab. of Semicond. Mater. Sci., Inst. of Semicond., Beijing, China
  • fYear
    2015
  • Firstpage
    1
  • Lastpage
    3
  • Abstract
    Transistor lasers (TLs) with n-doped quantum wells (QWs), which own low threshold current, are reported in this paper. The exposed side walls of QWs introduce amounts of recombination centers, which damages the properties of deep ridge TLs greatly. It is found that the heavily doping in quantum wells can effectively alleviate this effect. Assuming that the surface recombination is 106 cm/s, the light output power and current gain of common emitter configurations as functions of varying doping concentration and ridge width are studied. With doping concentration of 1018 cm-3 and ridge width of 2μm, the threshold current of TLs can be reduced from more than 100 mA to 31 mA and current gain can be increased from 0.1 to 2.4.
  • Keywords
    quantum well lasers; semiconductor doping; surface recombination; transistors; MQWS; N-doping effect; common emitter configurations; current gain; deep ridge TL; deep ridge transistor lasers; light output power; low threshold current; n-doped quantum wells; ridge width; surface recombination; varying doping concentration; Doping; Modulation; Power generation; Quantum well devices; Radiative recombination; Threshold current; Transistors; doping concentration; n-doped MQWs; ridge width; surface recombination; transistor lasers;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Optical Communications and Networks (ICOCN), 2015 14th International Conference on
  • Conference_Location
    Nanjing
  • Type

    conf

  • DOI
    10.1109/ICOCN.2015.7203754
  • Filename
    7203754