• DocumentCode
    1650058
  • Title

    EDA solutions to new-defect detection in advanced process technologies

  • Author

    Marinissen, Erik Jan ; Vandling, Gilbert ; Goel, Sandeep Kumar ; Hapke, Friedrich ; Rivers, Jason ; Mittermaier, Nikolaus ; Bahl, Swapnil

  • Author_Institution
    IMEC, Leuven, Belgium
  • fYear
    2012
  • Firstpage
    123
  • Lastpage
    128
  • Abstract
    For decades, EDA test generation tools for digital logic have relied on the Stuck-At fault model, despite the fact that process technologies moved forward from TTL (for which the Stuck-At fault model was originally developed) to nanometer-scale CMOS. Under pressure from their customers, especially in quality-sensitive application domains such as automotive, in recent years EDA tools have made great progress in improving their detection capabilities for new defects in advanced process technologies. For this Hot-Topic Session, we invited the three major EDA vendors to present their recent greatest innovations in hiqh-quality automatic test pattern generation, as well as their lead customers to testify of actual production results.
  • Keywords
    CMOS logic circuits; automatic test pattern generation; fault diagnosis; logic testing; EDA solutions; Stuck-At fault model; advanced process technologies; digital logic; hiqh-quality automatic test pattern generation; nanometer-scale CMOS; new-defect detection; quality-sensitive application domains; underpressure; Automatic test pattern generation; Circuit faults; Delay; Libraries; Production;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Design, Automation & Test in Europe Conference & Exhibition (DATE), 2012
  • Conference_Location
    Dresden
  • ISSN
    1530-1591
  • Print_ISBN
    978-1-4577-2145-8
  • Type

    conf

  • DOI
    10.1109/DATE.2012.6176444
  • Filename
    6176444