Excimer laser-annealed dopant segregated Schottky (ELA-DSS) Si nanowire gate-all-around (GAA) pFET with near zero effective Schottky barrier height (SBH)

We demonstrate excimer laser annealed dopant segregated Schottky (ELA-DSS) junction on gate-all-around (GAA) silicon nanowire pFETs. The metal-semiconductor junction interfacial doping is increased by two-fold with the ELA method. On silicon nanowire, the method achieves an effective Schottky barrier height (SBH) of nearly zero, improves the short channel performance and reduces the parasitic resistance of the fabricated devices, leading to an average improvement of 37% in I_ON as compared to the devices fabricated without laser annealing.