• DocumentCode
    1651502
  • Title

    3D heterogeneous opto-electronic integration technology for system-on-silicon (SOS)

  • Author

    Lee, K.-W. ; Noriki, A. ; Kiyoyama, K. ; Kanno, S. ; Kobayashi, R. ; Jeong, W.-C. ; Bea, J.-C. ; Fukushima, T. ; Tanaka, T. ; Koyanagi, M.

  • Author_Institution
    Dept. of Bioeng. & Robot., Tohoku Univ., Sendai, Japan
  • fYear
    2009
  • Firstpage
    1
  • Lastpage
    4
  • Abstract
    We proposed 3D heterogeneous opto-electronic integration technology for system-on-silicon (SOS). In order to realize 3D opto-electronic integrated system-on-silicon (SOS), we developed novel heterogeneous integration technology of LSI, MEMS and optoelectronic devices by implementing 3D heterogeneous opto-electronic multi-chip module composed with LSI, passives, MEMS and optoelectronic devices. The electrical interposer mounted with amplitude shift keying (ASK) LSI, LC filter and pressure-sensing MEMS chips and the optical interposer embedded with vertical-cavity surface-emitting laser (VCSEL) and photodiode (PD) chips are precisely bonded to form 3D opto-electronic multi-chip module. Opto-electronic devices are electrically connected via through-silicon vias (TSVs) which were formed into the interposers. Micro-fluidic channels are formed into the interposer by wafer direct bonding technique. 3D heterogeneous opto-electronic multi-chip module is successfully implemented for the first time.
  • Keywords
    integrated optoelectronics; multichip modules; system-on-chip; three-dimensional integrated circuits; 3D heterogeneous opto-electronic integration technology; LC filter; VCSEL; amplitude shift keying LSI; electrical interposer; microfluidic channels; multichip module; optical interposer; photodiode chips; pressure-sensing MEMS chips; system-on-silicon; through-silicon vias; vertical-cavity surface-emitting laser; wafer direct bonding technique; Amplitude shift keying; Large scale integration; Micromechanical devices; Optical filters; Optoelectronic devices; Photodiodes; Surface emitting lasers; Through-silicon vias; Vertical cavity surface emitting lasers; Wafer bonding;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting (IEDM), 2009 IEEE International
  • Conference_Location
    Baltimore, MD
  • Print_ISBN
    978-1-4244-5639-0
  • Electronic_ISBN
    978-1-4244-5640-6
  • Type

    conf

  • DOI
    10.1109/IEDM.2009.5424305
  • Filename
    5424305