DocumentCode
1652550
Title
Time-dependent calculations of Loeb and Kaplan´s scaling laws for high-pressure capillary discharges using FRED code
Author
Boyer, C.J. ; Bourham, M.A.
Author_Institution
Dept. of Nucl. Eng., North Carolina State Univ., Raleigh, NC, USA
fYear
1998
Firstpage
273
Abstract
Summary form only given. A capillary discharge is used to generate a low-temperature, high-density plasma via an ablation mechanism of the liner material based on the theory of ablation-controlled arcs. Such electrothermal plasma sources are used on two facilities at N.C. State University, SIRENS and PIPE facilities. Scaling laws derived by A. Loeb and Z. Kaplan describe the plasma properties for such capillary discharges such as temperature, heat flux, resistivity, ablation, pressure, and density. Calculations were done using an iterative numeric scheme in the program FRED for a series of shots on the PIPE device, using the measured discharge current as input to the code. Other discharge parameters are compared to FRED calculations. Results are compared to time-averaged temperatures obtained from optical emission spectroscopy, and other plasma parameters obtained from ODIN code calculations. Modifications are currently being employed to include a library for various liner materials.
Keywords
discharges (electric); plasma production; plasma temperature; -dependent calculations; FRED code; Kaplan scaling laws; Loeb scaling laws; PIPE facility; SIRENS facility; ablation; ablation mechanism; ablation-controlled arcs; capillary discharge; density; discharge parameters; electrothermal plasma sources; heat flux; high-pressure capillary discharges; liner material; low-temperature high-density plasma; plasma parameters; pressure; resistivity; scaling laws; temperature; Conductivity; Current measurement; Electrothermal effects; Fault location; Plasma materials processing; Plasma measurements; Plasma properties; Plasma sources; Plasma temperature; Stimulated emission;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science, 1998. 25th Anniversary. IEEE Conference Record - Abstracts. 1998 IEEE International on
Conference_Location
Raleigh, NC, USA
ISSN
0730-9244
Print_ISBN
0-7803-4792-7
Type
conf
DOI
10.1109/PLASMA.1998.677850
Filename
677850
Link To Document