Double-patterning friendly grid-based detailed routing with online conflict resolution

Double patterning lithography (DPL) is seen as one of the most promising solutions for new technology nodes such as 32nm and 22nm. However, DPL faces the challenges of handling layout decomposition and overlay errors. Currently, most DPL solutions use post-layout decomposition which requires multiple iterations and designer intervention to achieve a decomposable layout as designs scale larger. Recent research is starting to consider DPL constraints during the layout design phase especially during the detailed routing phase. In this work, we propose DPL-aware grid-based detailed routing algorithm supported with online conflict resolution. The conflict resolution algorithm uses a graph structure to represent geometrical relations between routed polygons and helps in conflict detection and color assignment. Experimental results indicate that this enhanced algorithm reduces the number of conflicts by 60% on average.