DocumentCode
1668544
Title
Characterization of SOI wafers by temporal decay measurement of condensate luminescence
Author
Ibuka, S. ; Tajima, M.
fYear
2001
Firstpage
37
Lastpage
38
Abstract
In this study, we focused on the temporal decay of the luminescence due to highly dense carriers in the superficial SOI film. We measured the dependence of the decay on excitation intensity and time-resolved spectra, and found that the decay under low excitation condition depended on the surface/interface condition and method of fabrication. These results allow us to view the present method as a powerful tool for characterization of SOI wafers.
Keywords
elemental semiconductors; interface structure; photoluminescence; silicon; silicon compounds; silicon-on-insulator; time resolved spectra; SOI wafers; Si-SiO/sub 2/; condensate luminescence; excitation intensity; highly dense carriers; low excitation condition; surface/interface condition; temporal decay; time-resolved spectra; Extraterrestrial measurements; Luminescence; Photoluminescence; Plasma temperature; Pulse measurements; Semiconductor films; Silicon on insulator technology; Spectral shape; Thin film devices; Wafer bonding;
fLanguage
English
Publisher
ieee
Conference_Titel
SOI Conference, 2001 IEEE International
Conference_Location
Durango, CO, USA
ISSN
1078-621X
Print_ISBN
0-7803-6739-1
Type
conf
DOI
10.1109/SOIC.2001.957973
Filename
957973
Link To Document