• DocumentCode
    1668544
  • Title

    Characterization of SOI wafers by temporal decay measurement of condensate luminescence

  • Author

    Ibuka, S. ; Tajima, M.

  • fYear
    2001
  • Firstpage
    37
  • Lastpage
    38
  • Abstract
    In this study, we focused on the temporal decay of the luminescence due to highly dense carriers in the superficial SOI film. We measured the dependence of the decay on excitation intensity and time-resolved spectra, and found that the decay under low excitation condition depended on the surface/interface condition and method of fabrication. These results allow us to view the present method as a powerful tool for characterization of SOI wafers.
  • Keywords
    elemental semiconductors; interface structure; photoluminescence; silicon; silicon compounds; silicon-on-insulator; time resolved spectra; SOI wafers; Si-SiO/sub 2/; condensate luminescence; excitation intensity; highly dense carriers; low excitation condition; surface/interface condition; temporal decay; time-resolved spectra; Extraterrestrial measurements; Luminescence; Photoluminescence; Plasma temperature; Pulse measurements; Semiconductor films; Silicon on insulator technology; Spectral shape; Thin film devices; Wafer bonding;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    SOI Conference, 2001 IEEE International
  • Conference_Location
    Durango, CO, USA
  • ISSN
    1078-621X
  • Print_ISBN
    0-7803-6739-1
  • Type

    conf

  • DOI
    10.1109/SOIC.2001.957973
  • Filename
    957973