DocumentCode
1668988
Title
Partial trench isolated body-tied (PTIBT) structure for SOI applications
Author
Min, B.W. ; Dakshina-Murthy, S. ; Mendicino, M.
Author_Institution
Digital DNA Labs., Motorola, Austin, TX, USA
fYear
2001
Firstpage
71
Lastpage
72
Abstract
Silicon on insulator (SOI) technology has gained interest to provide improvements in speed and power consumption over bulk technologies. However, floating body effects of SOI devices such as kinks, parasitic bipolar action and hysteretic propagation delay have retarded its application. To eliminate these undesirable effects several body-tied structures have been suggested, but all generally suffer from adverse costs such as performance degradation and/or process complexity. We propose a novel body-tied structure, adding simple partial trench isolation, which effectively suppresses the floating body effects without performance degradation.
Keywords
MOSFET; scanning electron microscopy; semiconductor device measurement; silicon-on-insulator; PTIBT; SOI applications; floating body effect suppression; floating body effects; hysteretic propagation delay; kinks; parasitic bipolar action; partial trench isolated body-tied structure; silicon on insulator; CMOS process; CMOS technology; Capacitance; DNA; Degradation; Energy consumption; Etching; Isolation technology; Laboratories; Silicon on insulator technology;
fLanguage
English
Publisher
ieee
Conference_Titel
SOI Conference, 2001 IEEE International
Conference_Location
Durango, CO, USA
ISSN
1078-621X
Print_ISBN
0-7803-6739-1
Type
conf
DOI
10.1109/SOIC.2001.957990
Filename
957990
Link To Document