• DocumentCode
    1669568
  • Title

    Design and fabrication of JFET-controlled carbon nanotube field emitter arrays

  • Author

    Shui, Qiong ; Chan, Chung-Y ; Gundersen, Martin A. ; Umstattd, Ryan J. ; Shaw, Jonathan L. ; Hsu, David S.Y.

  • Author_Institution
    Southern California Univ., Los Angeles, CA, USA
  • fYear
    2005
  • Firstpage
    294
  • Lastpage
    295
  • Abstract
    In this paper, a novel structure design, JFET-controlled carbon nanotubes (CNTs), is proposed. CNTs may very well be the closest one that can come to having "ideal" field emitters. Further, they are stable at high temperatures, can have high electrical and thermal conductivity, and they exhibit ballistic electron transport. The built-in JFET was designed by a 2-D device simulator ATLAS. It is to control the stability of the emission current of the CNTs while it is operating in saturation region. The dose and ion energy of BF2 in the ion implantation for p+ region were 5×1015 /cm and 200 keV, respectively. The vertical diffusion as well as the lateral diffusion of the boron ions in the high temperature process steps was taken into consideration in the simulation. Si post structure was chosen since it improves control of CNT length and allows for thick gate insulators. Our simulation results predict that the breakdown voltage of Si JFETs increases with the height of the Si post. We observe from that when Vgs is more negative, the depletion region extends in the channel and less current is flowing from the drain to source. By controlling the electron source supply to the CNTs, we can prevent disruptively excessive emission current.
  • Keywords
    boron compounds; carbon nanotubes; diffusion; elemental semiconductors; field emitter arrays; ion implantation; junction gate field effect transistors; semiconductor device models; silicon; 2-D device simulator ATLAS; CNT length; JFET-controlled carbon nanotube field emitter arrays; Si-C:BF2+; breakdown voltage; depletion region; electron source supply; emission current; high temperature process steps; ion energy; ion implantation; lateral diffusion; vertical diffusion; Boron; Carbon nanotubes; Electrons; Fabrication; Field emitter arrays; Ion implantation; Stability; Temperature; Thermal conductivity; Thickness control;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Vacuum Nanoelectronics Conference, 2005. IVNC 2005. Technical Digest of the 18th International
  • Print_ISBN
    0-7803-8397-4
  • Type

    conf

  • DOI
    10.1109/IVNC.2005.1619602
  • Filename
    1619602