• DocumentCode
    1669690
  • Title

    Magnetostrictive properties of amorphous TbFe/FeB multilayer thin films by DC magnetron sputtering

  • Author

    Wang, Wei ; Mi, Yiming ; Qian, Shiqiang ; Zhou, Xiying

  • Author_Institution
    Sch. of Mater. Eng., Shanghai Univ. of Eng. Sci., Shanghai, China
  • fYear
    2010
  • Firstpage
    1124
  • Lastpage
    1125
  • Abstract
    Magnetostrictive multilayer films which consists of amorphous TbFe and FeB were prepared by dc magnetron sputtering onto glass substrates. The structure, magnetic and magnetostrictive properties of TbFe/FeB multilayer thin films were investigated at different annealing temperatures. The results reveal that the soft magnetic and magnetostrictive properties for TbFe/FeB multilayer thin films compared to TbFe single layer thin films were obviously improved. In comparison to the intrinsic coercivity JHc of 59.2 kA/m for TbFe single layer thin films, the intrinsic coercivity JHc for TbFe/FeB multilayer thin films rapidly drops to 27.3 kA/m. After annealing at 350°C for 60 min, the maximum saturation magnetostrictive coefficient of ¿s = 410 × 10-6 was obtained. The best low-field magnetostrictive coefficient could reach to 177 × 10-6 under 40 kA/m external magnetic field for the TbFe/FeB multilayer thin films after annealing at 250°C for 60 min.
  • Keywords
    amorphous magnetic materials; annealing; boron alloys; coercive force; iron alloys; magnetic multilayers; magnetic thin films; magnetostriction; soft magnetic materials; sputtered coatings; terbium alloys; DC magnetron sputtering; TbFe-FeB; amorphous multilayer thin films; annealing temperatures; glass substrates; intrinsic coercivity; low-field magnetostrictive coefficient; saturation magnetostrictive coefficient; soft magnetic property; temperature 250 degC; temperature 350 degC; time 60 min; Amorphous magnetic materials; Amorphous materials; Annealing; Magnetic films; Magnetic multilayers; Magnetic properties; Magnetostriction; Saturation magnetization; Soft magnetic materials; Sputtering;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Nanoelectronics Conference (INEC), 2010 3rd International
  • Conference_Location
    Hong Kong
  • Print_ISBN
    978-1-4244-3543-2
  • Electronic_ISBN
    978-1-4244-3544-9
  • Type

    conf

  • DOI
    10.1109/INEC.2010.5425002
  • Filename
    5425002