• DocumentCode
    1677863
  • Title

    Monte Carlo modeling of coherent scattering: influence of interference

  • Author

    Leliveld, C.J. ; Maas, J.G. ; Bom, V.R. ; van Eijk, C.W.E.

  • Author_Institution
    Found. for Fundamental Res. on Matter, Rijswijk, Netherlands
  • Volume
    3
  • fYear
    1995
  • Firstpage
    1543
  • Abstract
    In this study, the authors present Monte Carlo (MC) simulation results for the intensity and angular distribution of scattered radiation from cylindrical absorbers. For coherent scattering the authors have taken into account the effects of interference by using new molecular form factor data for the AAPM plastic materials and water. The form factor data were compiled from X-ray diffraction measurements. The new data have been implemented in the authors´ Electron Gamma Shower (EGS4) Monte Carlo system. The hybrid MC simulation results show a significant influence on the intensity and the angular distribution of coherently scattered photons. It is concluded that MC calculations are significantly in error when interference effects are ignored in the model for coherent scattering. Especially for simulation studies of scattered radiation in collimated geometries, where small angle scattering will prevail, the coherent scatter contribution is highly overestimated when conventional form factor data are used
  • Keywords
    Monte Carlo methods; X-ray scattering; diagnostic radiography; AAPM plastic materials; EGS4; Electron Gamma Shower Monte Carlo system; Monte Carlo modeling; X-ray diffraction measurements; X-ray imaging; coherent scattering; collimated geometries; cylindrical absorbers; diagnostic radiology; form factor data; scattered radiation; water; Collimators; Electromagnetic scattering; Electrons; Interference; Monte Carlo methods; Particle scattering; Plastics; Solid modeling; X-ray diffraction; X-ray scattering;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Nuclear Science Symposium and Medical Imaging Conference Record, 1995., 1995 IEEE
  • Conference_Location
    San Francisco, CA
  • Print_ISBN
    0-7803-3180-X
  • Type

    conf

  • DOI
    10.1109/NSSMIC.1995.500320
  • Filename
    500320