The PICCO project: a survey

Author

De La Rue, Richard M. ; Krauss, Thomas F.

Author_Institution

Dept. of Electron. & Electr. Eng., Glasgow Univ., UK

Volume

2

fYear

2002

fDate

6/24/1905 12:00:00 AM

Firstpage

2

Abstract

This presentation will provide a limited overview of work carried out in the multi-partner PICCO (photonic integrated circuits by crystal optics) project. In particular, the III-V material system used in PICCO is the AlGaAs/GaAs material system. In the PICCO project, the approach used for lithographic pattern definition has been, so far, primarily the ´conventional´ one, i.e. direct-write electron-beam lithography. But, at the outset, our recognition of the need for a genuinely mass-production approach has led to work on excimer-laser based photolithography, with high-precision masks giving a replicative approach.

Keywords

III-V semiconductors; aluminium compounds; electron beam lithography; gallium arsenide; integrated optics; integrated optoelectronics; photolithography; photonic crystals; replica techniques; AlGaAs-GaAs; AlGaAs/GaAs; PICCO project; direct-write electron-beam lithography; excimer-laser based photolithography; high-precision masks; lithographic pattern definition; mass-production approach; photonic integrated circuits by crystal optics; photonic-crystal structure; replicative approach; Gallium arsenide; Lithography; Optical fiber devices; Optical fibers; Optical waveguides; Photonic crystals; Photonic integrated circuits; Semiconductor materials; Semiconductor waveguides; Silicon on insulator technology;

fLanguage

English

Publisher

ieee

Conference_Titel

Transparent Optical Networks, 2002. Proceedings of the 2002 4th International Conference on

Print_ISBN

0-7803-7375-8

Type

conf

DOI

10.1109/ICTON.2002.1007830

Filename

1007830