Comparison Of Etch Performance In The Gec Referxmce Cdl With A Cqmmemial Etcher

Author

Pender, J. ; Buie, M. ; Brake, M. ; Elta, M.

Author_Institution

University of Michigan

fYear

1994

Firstpage

174

Lastpage

174

Keywords

Aluminum; Argon; Electrodes; Etching; Fault location; Ion sources; Masers; Plasma applications; Resonance; Voltage;

fLanguage

English

Publisher

ieee

Conference_Titel

Plasma Science, 1994. Conference Record - Abstracts., 1994 IEEE International Conference on

Conference_Location

Santa Fe, NM, USA

ISSN

0730-9244

Print_ISBN

0-7803-2006-9

Type

DOI

10.1109/PLASMA.1994.589008

Filename

589008

Link To Document