DocumentCode
1693210
Title
Effectiveness of the energy transport drift-diffusion model for submicrometer GaAs MESFETs
Author
Yamada, Y.
Author_Institution
Dept. of Inf. Syst., Tokai Univ., Kanagawa, Japan
Volume
1
fYear
1995
Firstpage
327
Abstract
The energy transport drift-diffusion model is presented for submicron GaAs MESFETs, which accepts the physically-meaningful effective V-F characteristics depending on the distribution of the drift electric field or the drain voltage. They are evaluated using the 1D balance equations of momentum and energy. The drift velocity is described by a double-valued function of the drift electric field. This property is caused by the inertia motion of the Γ-valley electrons for the small drain voltage and by the hot electron effect for the large drain voltage. The present results well agree with the experimental and ensemble Monte Carlo simulation ones
Keywords
III-V semiconductors; Schottky gate field effect transistors; electric fields; gallium arsenide; hot carriers; semiconductor device models; Γ-valley electrons; 1D balance equations; GaAs; V-F characteristics; drain voltage; drift electric field; energy transport drift-diffusion model; hot electron effect; submicron MESFETs; Charge carrier processes; Computational modeling; Electromagnetic compatibility; Electron mobility; Gallium arsenide; Kinetic energy; MESFETs; Monte Carlo methods; Poisson equations; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Microelectronics, 1995. Proceedings., 1995 20th International Conference on
Conference_Location
Nis
Print_ISBN
0-7803-2786-1
Type
conf
DOI
10.1109/ICMEL.1995.500889
Filename
500889
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