• DocumentCode
    1693210
  • Title

    Effectiveness of the energy transport drift-diffusion model for submicrometer GaAs MESFETs

  • Author

    Yamada, Y.

  • Author_Institution
    Dept. of Inf. Syst., Tokai Univ., Kanagawa, Japan
  • Volume
    1
  • fYear
    1995
  • Firstpage
    327
  • Abstract
    The energy transport drift-diffusion model is presented for submicron GaAs MESFETs, which accepts the physically-meaningful effective V-F characteristics depending on the distribution of the drift electric field or the drain voltage. They are evaluated using the 1D balance equations of momentum and energy. The drift velocity is described by a double-valued function of the drift electric field. This property is caused by the inertia motion of the Γ-valley electrons for the small drain voltage and by the hot electron effect for the large drain voltage. The present results well agree with the experimental and ensemble Monte Carlo simulation ones
  • Keywords
    III-V semiconductors; Schottky gate field effect transistors; electric fields; gallium arsenide; hot carriers; semiconductor device models; Γ-valley electrons; 1D balance equations; GaAs; V-F characteristics; drain voltage; drift electric field; energy transport drift-diffusion model; hot electron effect; submicron MESFETs; Charge carrier processes; Computational modeling; Electromagnetic compatibility; Electron mobility; Gallium arsenide; Kinetic energy; MESFETs; Monte Carlo methods; Poisson equations; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microelectronics, 1995. Proceedings., 1995 20th International Conference on
  • Conference_Location
    Nis
  • Print_ISBN
    0-7803-2786-1
  • Type

    conf

  • DOI
    10.1109/ICMEL.1995.500889
  • Filename
    500889