Model-based control in microelectronics manufacturing

Author

Edgar, T.F. ; Campbell, W.J. ; Bode, C.

Author_Institution

Dept. of Chem. Eng., Texas Univ., Austin, TX, USA

Volume

4

fYear

1999

fDate

6/21/1905 12:00:00 AM

Firstpage

4185

Abstract

In order to achieve process control systems in semiconductor manufacturing that are able to maximize yield at minimum cost, an integrated approach that combines advanced control techniques and mathematical modeling with available online measurements is necessary. We have utilized a model predictive control approach for multivariate run-to-run control of chemical mechanical planarization (CMP), lithography, and rapid thermal processing reactors. Improvements due to advanced control have been quantified in actual fab operations

Keywords

integrated circuit manufacture; lithography; observers; predictive control; rapid thermal processing; statistical process control; surface treatment; advanced control; advanced control techniques; chemical mechanical planarization; fab operations; integrated approach; microelectronics manufacturing; model predictive control approach; multivariate run-to-run control; online measurements; process control systems; semiconductor manufacturing; Costs; Manufacturing processes; Mathematical model; Microelectronics; Predictive control; Predictive models; Process control; Semiconductor device manufacture; Semiconductor device modeling; Virtual manufacturing;

fLanguage

English

Publisher

ieee

Conference_Titel

Decision and Control, 1999. Proceedings of the 38th IEEE Conference on

Conference_Location

Phoenix, AZ

ISSN

0191-2216

Print_ISBN

0-7803-5250-5

Type

conf

DOI

10.1109/CDC.1999.828018

Filename

828018