• DocumentCode
    1703223
  • Title

    Trimless second order curvature compensated bandgap reference using diffusion resistor

  • Author

    Kumar, Ajay

  • Author_Institution
    Texas Instrum., Dallas, TX, USA
  • fYear
    2009
  • Firstpage
    161
  • Lastpage
    164
  • Abstract
    A trim-less second order curvature compensated bandgap reference current using diffusion resistor is presented. An order of magnitude higher sheet-resistance (x50) and tighter process control of diffusion resistor than the poly has enabled this work to achieve the same current in one-third area. The process spread of diffusion resistor and VPNP transistor tracks each other, thereby resulting in higher accuracy without using any trim techniques. The proposed circuit is fabricated in a 0.5 mum CMOS process. The measured reference current has a variation of 46 ppm/degC over a temperature range of -55degC to 125degC.
  • Keywords
    CMOS integrated circuits; energy gap; process control; reference circuits; resistors; CMOS process; VPNP transistor; diffusion resistor; process control; sheet-resistance; size 0.5 mum; temperature -55 C to 125 C; trimless second order curvature compensated bandgap reference; CMOS process; Circuits; Current measurement; Photonic band gap; Process control; Resistors; Temperature distribution;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Custom Integrated Circuits Conference, 2009. CICC '09. IEEE
  • Conference_Location
    San Jose, CA
  • Print_ISBN
    978-1-4244-4071-9
  • Electronic_ISBN
    978-1-4244-4073-3
  • Type

    conf

  • DOI
    10.1109/CICC.2009.5280868
  • Filename
    5280868