DocumentCode
1709662
Title
Pulsed testing of a quasioptical gyrotron for materials processing
Author
Fischer, R.P. ; Fliflet, Arne W.
Author_Institution
Div. of Plasma Phys., Naval Res. Lab., Washington, DC, USA
fYear
1999
Firstpage
150
Abstract
Summary form only given. The quasioptical gyrotron (QOG) is under development at the Naval Research Laboratory as a high power source of millimeter-wave radiation. Recent experimental results include the production of up to 150 kW output power with 20% efficiency in 13 /spl mu/sec pulses. A new application of the QOG is the processing of ceramics and other non-metallic materials. High power millimeter-wave radiation offers unique capabilities for the application of coatings, sintering, brazing and soldering, and treatment of polymers. The new experiment is designed to produce 4 kW average power from 75-95 GHz using a 20 kV, 1.5 A DC electron beam. Initial pulsed testing has been performed at 20-60 kV cathode voltage, 0-6 A in 13 /spl mu/sec pulses. A pair of capacitive probes in the drift region are used to measure the average pitch ratio (/spl alpha/=/spl upsi//sub /spl perp////spl upsi//sub /spl par//) of the gyrating electron beam. The pitch ratio is varied by adjusting the magnetic field at the gun or the intermediate anode voltage. Measurements indicate that the average /spl alpha/ of the beam is less than simulation values for low cathode voltages.
Keywords
brazing; ceramics; coatings; gyrotrons; millimetre wave generation; polymers; sintering; soldering; 0 to 6 A; 1.5 A; 150 kW; 20 to 60 kV; 4 kW; 55 kV; 75 to 95 GHz; DC electron beam; anode voltage; brazing; capacitive probes; ceramics; coatings; drift region; gyrating electron beam; initial pulsed testing; low cathode voltages; materials processing; millimeter-wave radiation; nonmetallic materials; polymers; pulsed testing; quasioptical gyrotron; sintering; soldering; Cathodes; Electron beams; Gyrotrons; Laboratories; Magnetic field measurement; Materials processing; Materials testing; Power generation; Production; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science, 1999. ICOPS '99. IEEE Conference Record - Abstracts. 1999 IEEE International Conference on
Conference_Location
Monterey, CA, USA
ISSN
0730-9244
Print_ISBN
0-7803-5224-6
Type
conf
DOI
10.1109/PLASMA.1999.829392
Filename
829392
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