• DocumentCode
    1710949
  • Title

    Plasma suppression and spot size stabilization in single and multiple pulse flash X-ray radiography

  • Author

    Kwan, T.J.T. ; Snell, C.M.

  • Author_Institution
    Los Alamos Nat. Lab., NM, USA
  • fYear
    1999
  • Firstpage
    181
  • Abstract
    Summary form only given. Next generation X-ray radiography machines must use high electron beam current to provide the necessary dose and very small spot size to achieve the desired optical resolution. However, this combination of high current in a small area leads to undesirable side effects that were not important in old machines. Specifically, the intense local energy deposition from the high intensity electron beam causes vaporization of the bremsstrahlung target. The hot plasma thus generated provides a copious source of positive ions that are rapidly accelerated into the negative potential well of the incoming electron beam. As the ions propagate upstream, they partially charge neutralize the electron beam, causing its spot size to increase. We have studied the electron beam spot stabilization for the Dual Axis Radiographic Hydrotest Facility (DARHT).
  • Keywords
    X-ray apparatus; bremsstrahlung; plasma production; radiography; vaporisation; Dual Axis Radiographic Hydrotest Facility; bias potential; bremsstrahlung target; charge neutralisation; electron beam; electron beam current; energy degradation; high intensity electron beam; intense local energy deposition; ion trap; mechanical barrier; multiple pulse flash X-ray radiography; negative potential well; optical resolution; plasma plume; plasma suppression; positive ions; self-bias target; side effects; single pulse flash X-ray radiography; spot size; spot size stabilization; vaporization; Electron accelerators; Electron beams; Laboratories; Plasma accelerators; Plasma confinement; Plasma materials processing; Plasma stability; Plasma temperature; Plasma x-ray sources; Radiography;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science, 1999. ICOPS '99. IEEE Conference Record - Abstracts. 1999 IEEE International Conference on
  • Conference_Location
    Monterey, CA, USA
  • ISSN
    0730-9244
  • Print_ISBN
    0-7803-5224-6
  • Type

    conf

  • DOI
    10.1109/PLASMA.1999.829452
  • Filename
    829452