• DocumentCode
    1712000
  • Title

    The elecrodeless discharge at atmospheric pressure

  • Author

    Laroussi, Mounir

  • Author_Institution
    Appl. Res. Center, Old Dominion Univ., Norfolk, VA, USA
  • fYear
    1999
  • Firstpage
    203
  • Abstract
    Summary form only given, as follows. Recently the generation and applications of atmospheric pressure plasmas received increased interest in the plasma research community. Applications such as the surface modification of materials, and the decontamination of matter have been under investigation. In this context, we introduce a new means of generating an atmospheric pressure discharge, which is suitable for use in the above-mentioned applications, and in the treatment of undesirable or polluting gases, such as VOCs. This device is a capacitively coupled discharge. It is basically made of a nonconducting tube with two independent loops of wire wrapped around it, and separated by a distance d. A stable discharge is generated inside the tube when an AC voltage of few hundred volts to few kilovolts, at a frequency of few kilohertz, is applied between the loops. One end of the tube is completely open to the outside air, and a seed gas (generally a noble gas such as helium) is introduced in the tube. The plasma generated with this method is weakly ionized, cold, and is maintained by a relatively low input power (few tens of watts, depending on the size of the tube). In this paper, the discharge electrical characteristics, its radiation emission characteristics, and the measurement relevant plasma parameters will be presented.
  • Keywords
    discharges (electric); plasma materials processing; He; VOCs; atmospheric pressure; capacitively coupled discharge; elecrodeless discharge; electrical characteristics; materials surface modification; noble gas such; nonconducting tube; polluting gases treatment; radiation emission; undesirable gases treatment; weakly ionized cold plasma; Atmospheric-pressure plasmas; Decontamination; Plasma applications; Plasma materials processing; Plasma measurements; Plasma properties; Pollution; Surface contamination; Surface discharges; Surface treatment;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science, 1999. ICOPS '99. IEEE Conference Record - Abstracts. 1999 IEEE International Conference on
  • Conference_Location
    Monterey, CA, USA
  • ISSN
    0730-9244
  • Print_ISBN
    0-7803-5224-6
  • Type

    conf

  • DOI
    10.1109/PLASMA.1999.829493
  • Filename
    829493