• DocumentCode
    1713575
  • Title

    Electron angular distribution in an opening-switch-driven coaxial diode

  • Author

    Harper-Slaboszewicz, Victor J. ; Martinez, Carlos

  • Author_Institution
    Sandia Nat. Labs., Albuquerque, NM, USA
  • fYear
    1999
  • Firstpage
    236
  • Abstract
    Summary form only given. Characterization of the angular distribution of electrons produced in a coaxial high-current relativistic electron beam diode may be important in evaluating the applications of these diodes. This angular distribution has not previously been measured for an opening-switch-driven low impedance coaxial diode. Because the opening switch may have plasma in the vicinity of the diode, it is expected that the angular distribution may differ from that found in a closing-switch driven system. On the DECADE Module I, the distribution was measured using a multiple-aperture shadowbox imaging system, using radiochromic film to record the distribution. Nominal DM1 electron beam parameters are 1.7 MV peak voltage, 700 kA peak current, and 40 ns FWHM produced with a 6 inch diameter cathode. Twenty-one 0.332 cm diameter apertures on a grid pattern with a center-to-center spacing of 4.45 cm are distributed over the the central 8 inch diameter of the anode.
  • Keywords
    plasma diagnostics; plasma diodes; plasma flow; plasma switches; 1.7 MV; 40 ns; 6 inch; 700 kA; 8 inch; DECADE Module I; angular distribution; apertures; cathode; center-to-center spacing; coaxial high-current relativistic electron beam diode; distribution measurement; electron angular distribution; electron beam parameters; grid pattern; multiple-aperture shadowbox imaging system; opening-switch-driven coaxial diode; opening-switch-driven low impedance coaxial diode; peak current; peak voltage; radiochromic film; Apertures; Cathodes; Coaxial components; Diodes; Electron beams; Impedance measurement; Plasma applications; Plasma measurements; Switches; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science, 1999. ICOPS '99. IEEE Conference Record - Abstracts. 1999 IEEE International Conference on
  • Conference_Location
    Monterey, CA, USA
  • ISSN
    0730-9244
  • Print_ISBN
    0-7803-5224-6
  • Type

    conf

  • DOI
    10.1109/PLASMA.1999.829552
  • Filename
    829552