DocumentCode
1716362
Title
X-ray spectrometers with cylindrical, spherical and toroidal dispersive elements
Author
Baronova, E.O. ; Lider, V.V. ; Stepanenko, M.M. ; Vikhrev, V.V. ; Pereira, Nino R.
Author_Institution
Kurchatov (I.V.) Inst. of Atomic Energy, Moscow, Russia
fYear
1999
Firstpage
300
Abstract
Summary form only given. This paper describes a series of crystal spectrometers for soft X-ray diagnostics of pulsed plasmas. Most use high quality quartz crystals with different orientations of their crystal planes, attached by optical contact to spherical and toroidal substrates. We developed special procedures to attach spherical Johansson quartz crystals with optical contact, and to mount Cauchois type (transmission) crystals. Some mica crystals can be connected to the substrate with glue. The spectrometers cover an extended energy range, from the low end (0.7 keV) in reflection with a Johann or Johannson configuration to the high end (200 keV) with the Cauchois crystal. We use film as an X-ray detector. We pay special attention to spectral and spatial resolutions. These characteristics are modeled analytically and compared with experimental calibration. Some crystals have spectral resolution better than 9/spl times/10/sup -5/, and spatial resolution of a few microns. One of these is a uniquely large (100 mm by 40 mm) quartz crystal bent to a 3770 mm radius.
Keywords
X-ray spectrometers; plasma diagnostics; 0.7 keV; 200 keV; Cauchois type transmission crystals; Johann configuration; SiO/sub 2/; X-ray spectrometers; analytical model; crystal spectrometers; cylindrical dispersive elements; mica crystals; optical contact; pulsed plasmas; soft X-ray diagnostics; spherical Johansson quartz crystals; spherical dispersive elements; spherical substrates; toroidal dispersive elements; toroidal substrates; Crystals; Optical films; Optical pulses; Optical reflection; Plasma diagnostics; Plasma x-ray sources; Spatial resolution; Spectroscopy; Substrates; X-ray detectors;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science, 1999. ICOPS '99. IEEE Conference Record - Abstracts. 1999 IEEE International Conference on
Conference_Location
Monterey, CA, USA
ISSN
0730-9244
Print_ISBN
0-7803-5224-6
Type
conf
DOI
10.1109/PLASMA.1999.829665
Filename
829665
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