DocumentCode
1717186
Title
3-D PIC investigation of an output circuit for the relativistic klystron oscillator
Author
Bowers, L.A. ; Luginsland, J.W. ; Sasser, G.E. ; Watrous, J.J. ; Hendricks, K.J. ; Arman, M.J.
Author_Institution
Res. Lab., Kirtland AFB, NM, USA
fYear
1999
Firstpage
314
Abstract
Summary form only given, as follows. The relativistic klystron has been a promising HPM source for many years, and is currently under active research as a GW class tube. While considerable effort has been spent an understanding the bunching mechanism in both the amplifier and oscillator regimes, the issues for extracting HPM from a bunched intense relativistic electron beam (IREB) has received much less attention. In this research, we take advantage of the fact that we can isolate the output circuit from the rest of the source and concentrate on the physics of the IREB´s interaction with a low-Q extractor gap. Using a prescribed beam based on profiles consistent with experimental data and simulations of the modulator circuit, we investigate the relative importance of the modulation depth, harmonic content, distribution of kinetic and potential energy, and extractor impedance on the efficiency of power extraction. With this information, we identify features for successful extractor design for AFRL´s RKO.
Keywords
klystrons; microwave generation; microwave oscillators; microwave power amplifiers; particle beam bunching; relativistic electron beam tubes; simulation; 3D PIC investigation; GW class tube; amplifier; bunched intense relativistic electron beam; bunching mechanism; extractor impedance; harmonic content; high power microwave source; kinetic energy distribution; low-Q extractor gap; modulation depth; modulator circuit; oscillator; output circuit; potential energy distribution; power extraction; relativistic klystron oscillator; Circuit simulation; Data mining; Electron beams; Kinetic theory; Klystrons; Optical modulation; Oscillators; Physics; Potential energy; Power system harmonics;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science, 1999. ICOPS '99. IEEE Conference Record - Abstracts. 1999 IEEE International Conference on
Conference_Location
Monterey, CA, USA
ISSN
0730-9244
Print_ISBN
0-7803-5224-6
Type
conf
DOI
10.1109/PLASMA.1999.829698
Filename
829698
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