• DocumentCode
    1717712
  • Title

    InAlAs/InGaAsSb/InGaAs double heterojunction bipolar transistors with high current gain and low base sheet resistance

  • Author

    Chen, Shu-Han ; Chang, Chao-Min ; Chiang, Pei-Yi ; Wang, Sheng-Yu ; Chyi, Jen-Inn

  • Author_Institution
    Dept. of Electr. Eng., Nat. Central Univ., Jhongli
  • fYear
    2009
  • Firstpage
    319
  • Lastpage
    322
  • Abstract
    The proposed InAlAs/InGaAsSb/InGaAs double heterojunction bipolar transistors (DHBTs) exhibit a rather high current gain despite the use of a highly doped and thick InGaAsSb base layer, indicating that a high minority carrier lifetime exists in the InGaAsSb material. A high current gain over sheet resistance ratio, low cross-over current and a wide constant current gain range have been achieved, suggesting that the novel InAlAs/InGaAsSb/InGaAs DHBTs are grown with a high quality InGaAsSb base layer.
  • Keywords
    III-V semiconductors; aluminium compounds; carrier lifetime; gallium arsenide; gallium compounds; heterojunction bipolar transistors; indium compounds; InAlAs-InGaAsSb-InGaAs; double heterojunction bipolar transistors; high current gain; low base sheet resistance; minority carrier lifetime; Composite materials; Doping; Double heterojunction bipolar transistors; Electrons; Indium compounds; Indium gallium arsenide; Indium phosphide; Molecular beam epitaxial growth; Optical scattering; Sheet materials;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Indium Phosphide & Related Materials, 2009. IPRM '09. IEEE International Conference on
  • Conference_Location
    Newport Beach, CA
  • ISSN
    1092-8669
  • Print_ISBN
    978-1-4244-3432-9
  • Electronic_ISBN
    1092-8669
  • Type

    conf

  • DOI
    10.1109/ICIPRM.2009.5012505
  • Filename
    5012505