DocumentCode
1721900
Title
New approach for the extraction of gate voltage dependent series resistance and channel length reduction in CMOS transistors
Author
Brut, H. ; Juge, A. ; Ghibaudo, G.
Author_Institution
SGS-Thomson Microelectron., Crolles, France
fYear
1997
Firstpage
188
Lastpage
193
Abstract
The resistance based extraction method for the determination of effective channel length and series resistance behaviour with gate bias is critically analysed. The impossibility of extracting the gate voltage variations of these parameters concurrently is demonstrated. Then a new parameter extraction procedure is given and experimentally applied to a wide range of technologies, from 1.2 μm down to 0.1 μm. Finally, the lack of resolution in the determination of channel length reduction and series resistance when the effective gate bias tends to zero and the impact of the substrate gate bias on these parameters is studied in detail
Keywords
MOSFET; semiconductor device testing; 1.2 to 0.1 micron; CMOS transistor; channel length; gate voltage dependence; parameter extraction; series resistance; CMOS technology; Data mining; Design engineering; Electric resistance; Microelectronics; Parameter extraction; Research and development; Semiconductor device modeling; Substrates; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Microelectronic Test Structures, 1997. ICMTS 1997. Proceedings. IEEE International Conference on
Conference_Location
Monterey, CA
Print_ISBN
0-7803-3243-1
Type
conf
DOI
10.1109/ICMTS.1997.589391
Filename
589391
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