• DocumentCode
    1721900
  • Title

    New approach for the extraction of gate voltage dependent series resistance and channel length reduction in CMOS transistors

  • Author

    Brut, H. ; Juge, A. ; Ghibaudo, G.

  • Author_Institution
    SGS-Thomson Microelectron., Crolles, France
  • fYear
    1997
  • Firstpage
    188
  • Lastpage
    193
  • Abstract
    The resistance based extraction method for the determination of effective channel length and series resistance behaviour with gate bias is critically analysed. The impossibility of extracting the gate voltage variations of these parameters concurrently is demonstrated. Then a new parameter extraction procedure is given and experimentally applied to a wide range of technologies, from 1.2 μm down to 0.1 μm. Finally, the lack of resolution in the determination of channel length reduction and series resistance when the effective gate bias tends to zero and the impact of the substrate gate bias on these parameters is studied in detail
  • Keywords
    MOSFET; semiconductor device testing; 1.2 to 0.1 micron; CMOS transistor; channel length; gate voltage dependence; parameter extraction; series resistance; CMOS technology; Data mining; Design engineering; Electric resistance; Microelectronics; Parameter extraction; Research and development; Semiconductor device modeling; Substrates; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microelectronic Test Structures, 1997. ICMTS 1997. Proceedings. IEEE International Conference on
  • Conference_Location
    Monterey, CA
  • Print_ISBN
    0-7803-3243-1
  • Type

    conf

  • DOI
    10.1109/ICMTS.1997.589391
  • Filename
    589391