DocumentCode
1729588
Title
X3D: 3D X-ray lithography and development simulation for MEMS
Author
Hafizovic, S. ; Hirai, Y. ; Tabata, O. ; Korvink, J.G.
Author_Institution
Phys. Electron. Lab., Eidgenossische Tech. Hochschule, Zurich, Switzerland
Volume
2
fYear
2003
Firstpage
1570
Abstract
We report a novel simulation tool covering the complete process of X-ray lithography. Sub-steps of the procedure are mask generation, transient exposure, and transient resist dissolution. For the first time, accurate monolithic simulation of exposure and development for device-sized domains is possible. This provides the means for design and process verification and optimization for today´s complex moving mask systems, including those using multiple simultaneously moved masks.
Keywords
X-ray lithography; masks; micromechanical devices; photoresists; MEMS; X-ray lithography; mask; monolithic simulation; transient exposure; transient resist dissolution; Design optimization; Histograms; Laboratories; Micromechanical devices; Optical propagation; Polymers; Process design; Prototypes; Resists; X-ray lithography;
fLanguage
English
Publisher
ieee
Conference_Titel
TRANSDUCERS, Solid-State Sensors, Actuators and Microsystems, 12th International Conference on, 2003
Conference_Location
Boston, MA, USA
Print_ISBN
0-7803-7731-1
Type
conf
DOI
10.1109/SENSOR.2003.1217079
Filename
1217079
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