DocumentCode
1735021
Title
Microelectrode arrays for in situ measurement of redox potentials
Author
Lee, Jin-Hwan ; Jang, Am ; Bhadri, Prashant R. ; Kumar, Suresh A. ; Timmons, William ; Beyette, Fred R., Jr. ; Bishop, Paul L. ; Papautsky, Ian
Author_Institution
Dept. of Electr. & Comput. Eng., Cincinnati Univ., OH, USA
Volume
2
fYear
2005
Firstpage
1218
Abstract
This paper describes a microelectrode array (MEA) sensor system for measurements of oxidation-reduction potentials (ORP) in situ in the environment. The four-probe MEAs were fabricated from glass using a two-step, HF-based meniscus etching process. A CMOS ASIC chip was developed for signal acquisition and processing and packaged with the microelectrode sensors to reduce noise. The electrochemical performance of these ORP MEAs was fully characterized by measuring redox potentials of standard and reference solutions. The MEAs exhibited a substantially faster response time, proved to be extraordinarily stable, and were independent of the microelectrode position within the array.
Keywords
CMOS integrated circuits; application specific integrated circuits; chemical variables measurement; electrochemical sensors; etching; glass; microelectrodes; 1 cm; CMOS ASIC chip; glass; in situ measurement; meniscus etching; microelectrode array; microelectrode sensor; oxidation-reduction potential; redox potential; response time; sensor fabrication; signal acquisition; signal processing; Application specific integrated circuits; CMOS process; Etching; Glass; Microelectrodes; Packaging; Semiconductor device measurement; Sensor arrays; Sensor systems; Signal processing;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid-State Sensors, Actuators and Microsystems, 2005. Digest of Technical Papers. TRANSDUCERS '05. The 13th International Conference on
Print_ISBN
0-7803-8994-8
Type
conf
DOI
10.1109/SENSOR.2005.1497298
Filename
1497298
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