• DocumentCode
    1735021
  • Title

    Microelectrode arrays for in situ measurement of redox potentials

  • Author

    Lee, Jin-Hwan ; Jang, Am ; Bhadri, Prashant R. ; Kumar, Suresh A. ; Timmons, William ; Beyette, Fred R., Jr. ; Bishop, Paul L. ; Papautsky, Ian

  • Author_Institution
    Dept. of Electr. & Comput. Eng., Cincinnati Univ., OH, USA
  • Volume
    2
  • fYear
    2005
  • Firstpage
    1218
  • Abstract
    This paper describes a microelectrode array (MEA) sensor system for measurements of oxidation-reduction potentials (ORP) in situ in the environment. The four-probe MEAs were fabricated from glass using a two-step, HF-based meniscus etching process. A CMOS ASIC chip was developed for signal acquisition and processing and packaged with the microelectrode sensors to reduce noise. The electrochemical performance of these ORP MEAs was fully characterized by measuring redox potentials of standard and reference solutions. The MEAs exhibited a substantially faster response time, proved to be extraordinarily stable, and were independent of the microelectrode position within the array.
  • Keywords
    CMOS integrated circuits; application specific integrated circuits; chemical variables measurement; electrochemical sensors; etching; glass; microelectrodes; 1 cm; CMOS ASIC chip; glass; in situ measurement; meniscus etching; microelectrode array; microelectrode sensor; oxidation-reduction potential; redox potential; response time; sensor fabrication; signal acquisition; signal processing; Application specific integrated circuits; CMOS process; Etching; Glass; Microelectrodes; Packaging; Semiconductor device measurement; Sensor arrays; Sensor systems; Signal processing;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid-State Sensors, Actuators and Microsystems, 2005. Digest of Technical Papers. TRANSDUCERS '05. The 13th International Conference on
  • Print_ISBN
    0-7803-8994-8
  • Type

    conf

  • DOI
    10.1109/SENSOR.2005.1497298
  • Filename
    1497298