• DocumentCode
    1738437
  • Title

    Deadlock-free scheduling method for track systems in semiconductor fabrication

  • Author

    Yoon, Hyun Joong ; Lee, Doo Yong

  • Author_Institution
    Korea Adv. Inst. of Sci. & Technol., Seoul, South Korea
  • Volume
    3
  • fYear
    2000
  • fDate
    2000
  • Firstpage
    1787
  • Abstract
    This paper addresses a deadlock-free scheduling method for track systems in semiconductor fabrication. A track system is clustered equipment performing the photolithography process in semiconductor fabrication. Trends toward high automation and flexibility in the track systems accelerate the necessity of the intelligent scheduler that can guarantee reliability and optimize productivity of the track systems. We propose an efficient deadlock-free scheduling method that can avoid deadlock inherent to track systems and optimize the productivity. We employ two procedures for the deadlock-free scheduling. First, we define the potential deadlock set and deadlock-safe set to apply the deadlock avoidance policy efficiently. After introducing the potential deadlock set and the deadlock-safe set we propose a deadlock avoidance policy using an online Gantt chart, which can generate optimal or near-optimal schedules without deadlock. The proposed deadlock-free scheduling method is shown to be efficient in handling deadlock inherent to the track systems through simulation
  • Keywords
    computer integrated manufacturing; digital simulation; industrial robots; photolithography; scheduling; semiconductor device manufacture; deadlock avoidance policy; deadlock-free scheduling; intelligent scheduler; online Gantt chart; photolithography process; productivity; robots; semiconductor fabrication; simulation; track systems; Acceleration; Automation; Fabrication; Job shop scheduling; Lithography; Manufacturing systems; Processor scheduling; Productivity; Robots; System recovery;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Systems, Man, and Cybernetics, 2000 IEEE International Conference on
  • Conference_Location
    Nashville, TN
  • ISSN
    1062-922X
  • Print_ISBN
    0-7803-6583-6
  • Type

    conf

  • DOI
    10.1109/ICSMC.2000.886368
  • Filename
    886368