• DocumentCode
    1742509
  • Title

    Research of thick film copper circuit in microelectronic packaging

  • Author

    Xu, Z. ; Ma, J. ; Han, Z. ; Wang, Y. ; Huang, L. ; Tang, X.

  • Author_Institution
    Div. of Electron. Mater. & Packaging Technol., Tsinghua Univ., Beijing, China
  • fYear
    2000
  • fDate
    2000
  • Firstpage
    424
  • Lastpage
    426
  • Abstract
    Thick film copper circuits are a critical technology in microelectronic packaging. This paper emphasizes low temperature glass ceramics cofired with copper. Difficulties with LTCC/Cu packaging include organic removal and copper circuit protection. In different sintering techniques, by careful control of the oxygen partial pressure, the quality of the multilayer copper system can be ensured. Differential shrinkage characteristics of copper thick film and LTCC sheet result in delamination cracks and camber in the final products. Sintering promoters have an important effect on the conductivity and adhesion strength of copper thick film. The final structure of the sintered thick film appeared as a three-dimensional net
  • Keywords
    adhesion; ceramic packaging; copper; cracks; delamination; electrical conductivity; glass ceramics; hybrid integrated circuits; integrated circuit packaging; shrinkage; sintering; thick film circuits; 3D net final structure; Cu; LTCC sheet; LTCC/Cu packaging; O2; adhesion strength; camber; conductivity; copper; copper circuit protection; copper thick film; delamination cracks; differential shrinkage characteristics; low-temperature cofired glass ceramics; microelectronic packaging; multilayer copper system quality; organic removal; oxygen partial pressure; sintered thick film; sintering promoters; sintering techniques; thick film copper circuit; Ceramics; Copper; Glass; Microelectronics; Packaging; Pressure control; Protection; Temperature; Thick film circuits; Thick films;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electronic Materials and Packaging, 2000. (EMAP 2000). International Symposium on
  • Conference_Location
    Hong Kong
  • Print_ISBN
    0-7803-6654-9
  • Type

    conf

  • DOI
    10.1109/EMAP.2000.904193
  • Filename
    904193