DocumentCode
1753936
Title
Perspectives of CMOS technology from the viewpoint of variability
Author
Mogami, Tohru
Author_Institution
MIRAI-Selete, Japan
fYear
2010
fDate
18-20 Oct. 2010
Firstpage
1
Lastpage
27
Abstract
Presents a collection of slides covering the following topics: Variation is the most important issue for the Advanced CMOS & LSI´s; LWR and LER are main variation factors in FEOL; Absolute values of LWR/LER depend on process technology and DFM; We can improve LWR/LER and RDF, if understand the mechanisms correctly; Please try new process to improve LWR/LER and RDF.
Keywords
CMOS integrated circuits; CMOS technology; DFM; FEOL; LER; LSI; LWR; absolute values; process technology; variability; CMOS integrated circuits; Logic gates; Resistance;
fLanguage
English
Publisher
ieee
Conference_Titel
Semiconductor Manufacturing (ISSM), 2010 International Symposium on
Conference_Location
Tokyo
ISSN
1523-553X
Print_ISBN
978-1-4577-0392-8
Electronic_ISBN
1523-553X
Type
conf
Filename
5750202
Link To Document