• DocumentCode
    1770610
  • Title

    Enhanced laser damage behavior of laser mirror by modification of the top layer design

  • Author

    Schiltz, Drew ; Langton, P.F. ; Patel, Dinesh ; Emmert, L. ; Acquaroli, L.N. ; Baumgarten, C. ; Reagan, B. ; Rudolph, W. ; Markosyan, A. ; Route, R.R. ; Fejer, M. ; Rocca, Jorge J. ; Menoni, C.S.

  • Author_Institution
    Dept. of Electr. & Comput. Eng., Colorado State Univ., Fort Collins, CO, USA
  • fYear
    2014
  • fDate
    8-13 June 2014
  • Firstpage
    1
  • Lastpage
    2
  • Abstract
    We show the laser damage resistance of ion beam sputtered Ta2O5/SiO2 for high energy lasers can be increased by 50% when the Ta2O5 in the top few layers of the stack is replaced by HfO2 or Y2O3.
  • Keywords
    hafnium compounds; ion beam effects; laser beam effects; laser mirrors; optical multilayers; silicon compounds; sputtering; tantalum compounds; yttrium compounds; HfO2; Ta2O5-SiO2; Y2O3; enhanced laser damage behavior; high energy lasers; ion beam sputtering; laser damage resistance; laser mirror; stack; top layer design modification; Electric fields; Hafnium compounds; Measurement by laser beam; Mirrors; Pulsed laser deposition; Semiconductor lasers;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Lasers and Electro-Optics (CLEO), 2014 Conference on
  • Conference_Location
    San Jose, CA
  • Type

    conf

  • Filename
    6989011