DocumentCode
1770610
Title
Enhanced laser damage behavior of laser mirror by modification of the top layer design
Author
Schiltz, Drew ; Langton, P.F. ; Patel, Dinesh ; Emmert, L. ; Acquaroli, L.N. ; Baumgarten, C. ; Reagan, B. ; Rudolph, W. ; Markosyan, A. ; Route, R.R. ; Fejer, M. ; Rocca, Jorge J. ; Menoni, C.S.
Author_Institution
Dept. of Electr. & Comput. Eng., Colorado State Univ., Fort Collins, CO, USA
fYear
2014
fDate
8-13 June 2014
Firstpage
1
Lastpage
2
Abstract
We show the laser damage resistance of ion beam sputtered Ta2O5/SiO2 for high energy lasers can be increased by 50% when the Ta2O5 in the top few layers of the stack is replaced by HfO2 or Y2O3.
Keywords
hafnium compounds; ion beam effects; laser beam effects; laser mirrors; optical multilayers; silicon compounds; sputtering; tantalum compounds; yttrium compounds; HfO2; Ta2O5-SiO2; Y2O3; enhanced laser damage behavior; high energy lasers; ion beam sputtering; laser damage resistance; laser mirror; stack; top layer design modification; Electric fields; Hafnium compounds; Measurement by laser beam; Mirrors; Pulsed laser deposition; Semiconductor lasers;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics (CLEO), 2014 Conference on
Conference_Location
San Jose, CA
Type
conf
Filename
6989011
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