DocumentCode
1787796
Title
Investigation of self-catalyzed GaAs NW growth by Monte Carlo simulation
Author
Suprunets, Anastasiya G. ; Vasilenko, Maxim A. ; Shwartz, Nataliya L.
Author_Institution
Novosibirsk State Tech. Univ., Novosibirsk, Russia
fYear
2014
fDate
June 30 2014-July 4 2014
Firstpage
14
Lastpage
18
Abstract
Using a kinetic lattice Monte Carlo model self-catalyzed growth of GaAs nanowire (NW) on GaAs(111) B surface was realized. Dependence of NW morphology on growth parameters was demonstrated. Existence of optimal temperature and gallium/arsenic flux ratio, corresponding to maximal GaAs nanowire growth rate, was shown. NW growth rate was linearly depended on arsenic flux in wide range of arsenic flux intensity. Obtained decreasing dependence of self-catalyzed NW growth rate on initial catalyst drop diameter was less abrupt than for catalytic growth. The optimal growth temperature of self-catalyzed growth was higher than of catalytic growth. Self-catalyzed growth was demonstrated to be more sensitive to gallium/arsenic flux ratio than catalytic one.
Keywords
III-V semiconductors; Monte Carlo methods; catalysis; gallium arsenide; nanofabrication; nanowires; GaAs; GaAs(111) B surface; arsenic flux intensity; gallium-arsenic flux ratio; kinetic lattice Monte Carlo model; morphology; self-catalyzed nanowire; Gallium; Gallium arsenide; Monte Carlo methods; Nanoscale devices; Substrates; Surface morphology; Surface treatment; GaAs; Monte Carlo; nanowires; simulation;
fLanguage
English
Publisher
ieee
Conference_Titel
Micro/Nanotechnologies and Electron Devices (EDM), 2014 15th International Conference of Young Specialists on
Conference_Location
Novosibirsk
ISSN
2325-4173
Print_ISBN
978-1-4799-4669-3
Type
conf
DOI
10.1109/EDM.2014.6882465
Filename
6882465
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