• DocumentCode
    1787796
  • Title

    Investigation of self-catalyzed GaAs NW growth by Monte Carlo simulation

  • Author

    Suprunets, Anastasiya G. ; Vasilenko, Maxim A. ; Shwartz, Nataliya L.

  • Author_Institution
    Novosibirsk State Tech. Univ., Novosibirsk, Russia
  • fYear
    2014
  • fDate
    June 30 2014-July 4 2014
  • Firstpage
    14
  • Lastpage
    18
  • Abstract
    Using a kinetic lattice Monte Carlo model self-catalyzed growth of GaAs nanowire (NW) on GaAs(111) B surface was realized. Dependence of NW morphology on growth parameters was demonstrated. Existence of optimal temperature and gallium/arsenic flux ratio, corresponding to maximal GaAs nanowire growth rate, was shown. NW growth rate was linearly depended on arsenic flux in wide range of arsenic flux intensity. Obtained decreasing dependence of self-catalyzed NW growth rate on initial catalyst drop diameter was less abrupt than for catalytic growth. The optimal growth temperature of self-catalyzed growth was higher than of catalytic growth. Self-catalyzed growth was demonstrated to be more sensitive to gallium/arsenic flux ratio than catalytic one.
  • Keywords
    III-V semiconductors; Monte Carlo methods; catalysis; gallium arsenide; nanofabrication; nanowires; GaAs; GaAs(111) B surface; arsenic flux intensity; gallium-arsenic flux ratio; kinetic lattice Monte Carlo model; morphology; self-catalyzed nanowire; Gallium; Gallium arsenide; Monte Carlo methods; Nanoscale devices; Substrates; Surface morphology; Surface treatment; GaAs; Monte Carlo; nanowires; simulation;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Micro/Nanotechnologies and Electron Devices (EDM), 2014 15th International Conference of Young Specialists on
  • Conference_Location
    Novosibirsk
  • ISSN
    2325-4173
  • Print_ISBN
    978-1-4799-4669-3
  • Type

    conf

  • DOI
    10.1109/EDM.2014.6882465
  • Filename
    6882465