DocumentCode
1788874
Title
Net deposition efficiency of step-index GeO2 doped silica glass fabricated by MCVD
Author
Zulkifli, M.I. ; Omar, Nasr Y. M. ; Khairul Anuar, M.S. ; Hanif, S. ; Muhd-Yasin, S.Z. ; Aljamimi, S.M. ; Yusoff, Z. ; Abdul-Rashid, H.A.
Author_Institution
Photonic Lab., Telekom R&D, Cyberjaya, Malaysia
fYear
2014
fDate
2-4 Sept. 2014
Firstpage
143
Lastpage
146
Abstract
The net deposition efficiency which describes the successful incorporation of germania in silica was studied by varying the GeCl4 flow rate while maintaining that of SiCl4 constant. Both theoretical and experimentally-derived net deposition efficiencies were determined. The radial and longitudinal homogeneities of the fabricated preform were also determined. EDX analysis was also carried out to confirm the germanium presence in the fabricated preform.
Keywords
MOCVD; X-ray chemical analysis; germanium compounds; optical fabrication; optical glass; silicon compounds; EDX analysis; GeCl4 flow rate; MCVD; SiO2-GeO2; longitudinal homogeneities; net deposition efficiency; radial homogeneities; step-index GeO2 doped silica glass; Electron tubes; Fabrication; Indexes; Photonics; Preforms; Refractive index; Silicon compounds; MCVD; deposition; efficiency; germania;
fLanguage
English
Publisher
ieee
Conference_Titel
Photonics (ICP), 2014 IEEE 5th International Conference on
Conference_Location
Kuala Lumpur
Type
conf
DOI
10.1109/ICP.2014.7002337
Filename
7002337
Link To Document