• DocumentCode
    1793676
  • Title

    Silicon ridge waveguide directional couplers with improved tolerance to wafer-scale variations

  • Author

    Mikkelsen, Jared C. ; Sacher, Wesley D. ; Poon, Joyce K. S.

  • Author_Institution
    Dept. of Electr. & Comput. Eng., Univ. of Toronto, Toronto, ON, Canada
  • fYear
    2014
  • fDate
    9-13 March 2014
  • Firstpage
    1
  • Lastpage
    3
  • Abstract
    Silicon directional couplers are designed to be tolerant to width, height, coupling gap, and etch depth variations. Improvements in the wafer-scale variation of the splitting ratio are demonstrated in the IMEC Standard Passives process.
  • Keywords
    elemental semiconductors; integrated optics; optical directional couplers; ridge waveguides; silicon; tolerance analysis; IMEC Standard Passives process; Si; coupling gap; directional couplers; etch depth variations; height; silicon ridge waveguide; splitting ratio; tolerance; wafer-scale variations; width; Couplings; Directional couplers; Optical waveguides; Standards; Strips; Waveguide discontinuities;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Optical Fiber Communications Conference and Exhibition (OFC), 2014
  • Conference_Location
    San Francisco, CA
  • Print_ISBN
    978-1-5575-2994-7
  • Type

    conf

  • DOI
    10.1364/OFC.2014.Th2A.12
  • Filename
    6886744
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=1793676