DocumentCode
1793689
Title
A compact and alignment-tolerant Si polarization rotator for rib and channel waveguides
Author
Haifeng Zhou ; Huijuan Zhang ; Lianxi Jia ; Chao Li ; Xianshu Luo ; Guoqiang Lo
Author_Institution
Inst. of Microelectron., A*STAR (Agency for Sci., Technol. & Res.), Singapore, Singapore
fYear
2014
fDate
9-13 March 2014
Firstpage
1
Lastpage
3
Abstract
A compact (around 10μm long) and alignment-tolerant (no performance degradation under a misalignment of a waveguide width, typically > 300nm) polarization rotator with a single-sided slab is proposed by using two-step self-aligned photolithography.
Keywords
elemental semiconductors; light polarisation; optical fabrication; optical rotation; optical waveguides; photolithography; rib waveguides; silicon; Si; alignment-tolerant Si polarization rotator; channel waveguides; rib waveguides; single-sided slab; two-step self-aligned photolithography; Optical device fabrication; Optical waveguides; Rectangular waveguides; Silicon; Slabs; Time-domain analysis; Waveguide transitions;
fLanguage
English
Publisher
ieee
Conference_Titel
Optical Fiber Communications Conference and Exhibition (OFC), 2014
Conference_Location
San Francisco, CA
Print_ISBN
978-1-5575-2994-7
Type
conf
DOI
10.1364/OFC.2014.Th2A.7
Filename
6886750
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