DocumentCode
1793763
Title
Delayed interferometer based Si-wire WDM demultiplexers fabricated by phase controllable and productive 300-mm wafer-scale ArF-immersion lithography technology
Author
Seok-Hwan Jeong ; Shimura, Daisuke ; Simoyama, Takasi ; Horikawa, Tsuyoshi ; Tanaka, Yuichi ; Morito, Ken
Author_Institution
Photonics Electron. Technol. Res. Assoc. (PETRA), AIST, Tsukuba, Japan
fYear
2014
fDate
9-13 March 2014
Firstpage
1
Lastpage
3
Abstract
We report good phase controllability and high production yield in Si-wire delayed interferometer-type demultiplexers fabricated by 300-mm wafer-scale ArF-immersion lithography technologies. The results are promising for utilization in high-density WDM interconnects.
Keywords
demultiplexing equipment; elemental semiconductors; immersion lithography; interferometers; silicon; wavelength division multiplexing; Si; delayed interferometer-based siliicon wire WDM demultiplexers; high-density WDM interconnects; phase controllable wafer-scale ArF-immersion lithography technology; production yield; productive wafer-scale ArF-immersion lithography technology; size 300 mm; Adaptive optics; Lithography; Optical device fabrication; Optical filters; Optical interferometry; Optical waveguides; Wavelength division multiplexing;
fLanguage
English
Publisher
ieee
Conference_Titel
Optical Fiber Communications Conference and Exhibition (OFC), 2014
Conference_Location
San Francisco, CA
Print_ISBN
978-1-5575-2994-7
Type
conf
DOI
10.1364/OFC.2014.Th3F.5
Filename
6886789
Link To Document