Profile of electric and magnetic field strength in new plasma source using coaxially symmetric surface wave in VHF band

Summary form only given, as follows. For plasma processes, a uniform plasma over a large area has been required. As the plasma source satisfying this condition, surface-wave produced plasma (SWP) utilizing rf or microwave has gained attention as new plasma sources. A new type of SWP employing a coaxial antenna, into which rf (frequency of 149 MHz in VHF band and power of 900 W) is launched, is presented in this report. Its remarkable advantage is that the form of the produced plasma can flexibly vary on bending the antenna. In order to apply it to various processes, it is necessary to understand the basic characteristics. Hence, we calculated profiles of electric and magnetic field strength using the finite-element method. As a result, it is found that surface wave propagating in the boundary between dielectric and plasma surfaces produces a plasma, and the plasma diffuses in the radial direction.