• DocumentCode
    1810348
  • Title

    Properties of DC-biased plasma antenna

  • Author

    Chung, Max ; Chen, Wen-Shan ; Yu, Yen-Hao ; Liou, Zong Yao

  • Author_Institution
    Dept. of Electron. Eng., Southern Taiwan Univ., Tainan
  • Volume
    3
  • fYear
    2008
  • fDate
    21-24 April 2008
  • Firstpage
    1118
  • Lastpage
    1120
  • Abstract
    Plasma antenna is a general terms representing using plasma as a conductive medium to transmit or reflect signals. It has unique properties like low RCS, tunable impedance, and instant on-off capability. Previous plasma antenna uses 500 MHz 100 W RF power to generate a plasma column, which is limited in energy efficiency and bandwidth. We developed DC-biased plasma antenna, which has no operation frequency upper limit and low sustaining power. Signal is coupled to the plasma antenna via capacitive coupling. Plasma antennas of different length were studied, together with variant gas filled. Positive gain can be achieved at frequencies above the plasma characteristics frequency. Some frequencies shows resonance behavior when plasma is present. Impedance shifts slightly with the DC current. Radiation pattern is less uniform than metal antenna. Gain is related to signal power.
  • Keywords
    UHF antennas; antenna radiation patterns; plasma devices; DC-biased plasma antenna; antenna radiation pattern; capacitive coupling; frequency 500 MHz; plasma characteristics frequency; power 100 W; variant gas filled; Bandwidth; Energy efficiency; Impedance; Plasma properties; Power generation; Radio frequency; Reflector antennas; Resonance; Resonant frequency; Transmitting antennas;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microwave and Millimeter Wave Technology, 2008. ICMMT 2008. International Conference on
  • Conference_Location
    Nanjing
  • Print_ISBN
    978-1-4244-1879-4
  • Electronic_ISBN
    978-1-4244-1880-0
  • Type

    conf

  • DOI
    10.1109/ICMMT.2008.4540621
  • Filename
    4540621