DocumentCode
1816866
Title
Resistance extraction along the current flow
Author
Ladage, Lorenz ; Leupers, Rainer
Author_Institution
Luhrstuhl Inf., Dortmund Univ., Germany
fYear
1993
fDate
9-12 May 1993
Abstract
A novel algorithm for calculating the resistance of an arbitrarily shaped polygon within a VLSI mask layout analysis program is presented. In contrast to earlier approaches, no polygon decomposition is required. Instead, the current flow is determined by a routing algorithm. The resistance approximation is derived from the current flow. Experimental results have shown that this algorithm achieves more accurate results in comparatively little time. The average run time is small enough so that the algorithm can be used in a VLSI environment
Keywords
circuit layout CAD; CAMBIO CAD system; VLSI mask layout analysis program; arbitrarily shaped polygon; average run time; current flow; full custom layouts; geometric IC layout optimisation; resistance extraction; routing algorithm; Charge carriers; Equations; Roentgenium; Routing;
fLanguage
English
Publisher
ieee
Conference_Titel
Custom Integrated Circuits Conference, 1993., Proceedings of the IEEE 1993
Conference_Location
San Diego, CA
Print_ISBN
0-7803-0826-3
Type
conf
DOI
10.1109/CICC.1993.590741
Filename
590741
Link To Document