DocumentCode
1817742
Title
High throughput capability of a microfabricated hollow probe for near field microscopy in ultraviolet region
Author
Yatsui, T. ; Ueda, M. ; Kourogi, M. ; Ohtsu, M.
Author_Institution
Ohtsu Project, Japan Sci. & Technol. Corp., Tokyo, Japan
fYear
2001
fDate
11-11 May 2001
Firstpage
79
Lastpage
80
Abstract
Summary form only given. For realizing high sensitivity in high spatially resolved spectroscopy in ultraviolet (UV) region, we demonstrate here high throughput capability of a hollow probe fabricated by the transfer mold technique in a pyramidal silicon groove. In comparison with the conventional fiber probe, the advantages of such a probe are: 1. Hollow structure leads to no optical absorption in the UV region inside the probe, which results in high throughput. 2. Hollow structure leads to no luminescence in the UV region inside the probe, which results in high signal to noise ratio in the illumination-mode near field spectroscopy.
Keywords
micro-optics; moulding; optical fabrication; optical microscopy; probes; sensitivity; silicon; ultraviolet spectroscopy; Si; high signal to noise ratio; high throughput capability; illumination-mode near field spectroscopy; microfabricated hollow probe; near field microscopy; pyramidal silicon groove; transfer mold technique; ultraviolet region; Electromagnetic wave absorption; Luminescence; Microscopy; Optical noise; Optical sensors; Probes; Silicon; Spatial resolution; Spectroscopy; Throughput;
fLanguage
English
Publisher
ieee
Conference_Titel
Quantum Electronics and Laser Science Conference, 2001. QELS '01. Technical Digest. Summaries of Papers Presented at the
Conference_Location
Baltimore, MD, USA
Print_ISBN
1-55752-663-X
Type
conf
DOI
10.1109/QELS.2001.961881
Filename
961881
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