Technology and test of coplanar grounded wave-guides on micro-machined Si wafers

Author

Lucibello, Andrea ; De Angelis, Giorgio ; Proietti, Emanuela ; Marcelli, Romolo ; Bartolucci, Giancarlo

Author_Institution

CNR-IMM Roma, Roma

Volume

1

fYear

2008

fDate

13-15 Oct. 2008

Firstpage

219

Lastpage

222

Abstract

Coplanar wave-guide grounded lines (CPWG) have been designed, realized by micro-machining of high resistivity silicon wafers and tested up to 40 GHz. Different configurations have been compared between them by changing the dimensions of the micro-machined via-holes used for the ground connection, as well as their number and separation, to get the optimal electrical matching conditions. Wide-band matching and losses as low as 0.1-0.2 dB/mm have been obtained within the 40 GHz range, in agreement with the predicted behaviour.

Keywords

coplanar waveguides; elemental semiconductors; micromachining; silicon; Si; coplanar grounded waveguides; coplanar waveguide grounded lines; electrical matching; ground connection; high resistivity silicon wafers; micromachined silicon wafers; waveguide losses; wide-band matching; Chromium; Conductivity; Coplanar waveguides; Electronic equipment testing; Etching; Gold; Micromachining; Resists; Silicon; Wideband; RF MEMS; micromachining;

fLanguage

English

Publisher

ieee

Conference_Titel

Semiconductor Conference, 2008. CAS 2008. International

Conference_Location

Sinaia

ISSN

1545-827X

Print_ISBN

978-1-4244-2004-9

Type

conf

DOI

10.1109/SMICND.2008.4703374

Filename

4703374