• DocumentCode
    1824779
  • Title

    Workshop and panel discussions

  • Author

    Gossner, Harald ; Gaertner, Reinhold ; Carn, Brett ; Blanc, Fabrice ; Gauthier, Robert ; Boselli, Gianluca ; Duvvury, Charvaka

  • Author_Institution
    Intel Mobil Communications
  • fYear
    2011
  • fDate
    11-16 Sept. 2011
  • Firstpage
    1
  • Lastpage
    6
  • Abstract
    Due to downscaling of technology and increase of package size, a reduction in economically achievable CDM robustness of ICs is predicted. The workshop addresses the options and the status of CDM control in manufacturing and testing environments. The necessity of developing more advanced CDM control methods will be discussed. Another question is about the best way for world-wide implementation of advanced CDM control measures and the related costs.
  • Keywords
    Conferences; Electrostatic discharge; Foundries; IP networks; Integrated circuits; Manufacturing; Stress;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electrical Overstress/Electrostatic Discharge Symposium (EOS/ESD), 2011 33rd
  • Conference_Location
    Anaheim, CA
  • ISSN
    Pending
  • Electronic_ISBN
    Pending
  • Type

    conf

  • Filename
    6045619
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=1824779