• DocumentCode
    1827947
  • Title

    Reliability characterization of Phase Change Memory

  • Author

    Gleixner, Bob ; Pellizzer, Fabio ; Bez, Roberto

  • Author_Institution
    Numonyx, R&D - Technol. Dev., San Jose, CA, USA
  • fYear
    2009
  • fDate
    25-28 Oct. 2009
  • Firstpage
    7
  • Lastpage
    11
  • Abstract
    Phase Change Memory (PCM) has emerged as an attractive candidate for next-generation non-volatile memory devices. For these applications, reliability is determined by the ability to retain the state of data in the device and support a specified number of re-writes without failure. In PCM technologies, retention is limited by the meta-stable amorphous state of the cell. For cycling endurance (re-writes), failure occurs due to either void formation in the active material or contamination of the heating element of the cell. With optimized process integration and cell programming, large array devices based on a 90 nm PCM technology are able to support data retention to 10 years at 85°C and greater than 106 write cycles.
  • Keywords
    circuit reliability; phase change memories; cell programming; cycling endurance; heating element; meta-stable amorphous state; next-generation non-volatile memory devices; phase change memory; process integration; reliability characterization; void formation; Acceleration; Amorphous materials; Contamination; Crystallization; Failure analysis; Nonvolatile memory; Phase change materials; Phase change memory; Research and development; Robustness; chalcogenide; phase change memory; reliability;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Non-Volatile Memory Technology Symposium (NVMTS), 2009 10th Annual
  • Conference_Location
    Portland, OR
  • Print_ISBN
    978-1-4244-4953-8
  • Electronic_ISBN
    978-1-4244-4954-5
  • Type

    conf

  • DOI
    10.1109/NVMT.2009.5429783
  • Filename
    5429783